M2T Available Facilities
(Detailed INFO at http://www.artov.imm.cnr.it on
“Clean Room” and “Laboratories”)
General Purposes:
- Clean
Room Facilities:
Chemical benches
Photolithography
Reactive Ion Etching
Furnace for Si wafers oxidation
Films growth and characterization:
- two
vertical furnaces for LPE of magnetic films, temperature controlled and with
automatic dipping and movements of the substrates;
- RF
sputtering equipment for submicron garnet films and multilayers
deposition
- horizontal
furnace for materials thermal annealing;
- Logitech
machine for materials lapping and optical polishing;
- Kulicke & Soffa precision
dicing machine (mechanical movement precision close to 1 µm) with 4"
porous chuk, for allumina,
silicon and garnet films cutting;
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Furnaces for Liquid Phase Epitaxy of
Magnetic Garnets
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Precision dicing saw for wafers cutting (6 um resolution in blade
positioning)
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The elementary cell of a garnet material
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A LaGa:YIG film LPE grown in our Lab (right)
onto a [111]-oriented, 1" GGG substrate
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remotely
controlled Ferromagnetic Resonance (FMR) waveguide equipment for magnetic linewidth measurements at 9.25 GHz;
The FMR setup, with the
electromagnet for dc magnetic field sweep (left) waveguide system and cavity
for 9.24 GHz FMR (center), instruments and remote control (right)
- AFM,
Atomic Force Microscope;
- Facilities
for wafer processing for microsystem manufacturing
purposes (Si wafer oxidation, chemical etching techniques).
Microwave design and testing:
- Local
Area Network (LAN) composed of:
* hp9000/835 server for 8 users
(graphical consolle)
* hp9000/340C+ graphical workstation
* PC's (and terminals)
* HP7576A DraftPro
EXL Drafting Plotter
with
software for:
* electromagnetic design (MSC-Magnetic,
Mc Neal & Schwendler).
* Hewlett Packard Advanced Design System
for the simulation of microwave devices.
* MSW, purposely written and implemented
FORTRAN77 program for the frequency dependence of the electrical and dispersive
quantities of magnetostatic volume wave devices and
their graphical representation.
* AUTOCAD14 and ADS for microstrip circuits mask design.
* Applied Wave Research - Microwave
Office
* FORTRAN and STARBASE software for
general purposes computations and graphics.
* Hewlett Packard 8510C Network Analyzer
System up 50 GHz
* Probe Station for on wafer
measurements up to 50 GHz
* Small anechoic chamber for antenna
measurements from 33 GHz to 50 GHz
* Hewlett Packard 8510C Network Analyzer
System for S-parameters microwave devices characterization, remotely controlled
and equipped with:
* HP8341B Microwave Synthesizer (from
0.5 GHz up to 26 GHz)
* HP8514A test set (0.5 GHz - 18 GHz)
* Color Display and external interfaces
for video, computer and peripherals
* HP7475 plotter
* 3.5" internal and HP9122C
2x3.5" auxiliary disk drives
* time domain option
* precision flexible cables kit
* HP 3.5 mm calibration kit
* HP 7.0 mm calibration kit
* Intercontinental Microwave
de-embedding calibration kit
* Wiltron
Modular Source up to 18 GHz
- Hewlett
Packard 8562A Spectrum Analyzer (1 kHz - 22 GHz)
- Hewlett
Packard 54120A Digitizing Oscilloscope with 54121A test set up to 20 GHz
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HP8510C
Vector Network Analyzer for S-parameter measurement up to 18 GHz
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HP digital
oscilloscope for microwave and optical devices characterization up to 20 GHz
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HP Spectrum Analyzer up to 22 GHz
Probe Station for on-wafer
measurements up to 50 GHz
